Gas chromatography-Mass spectrometer GCMS-QP2020 NX From Shimadzu, Japan
Ion
Source Featuring High Sensitivity and Long-Term Stability, One Touch Inlet
Maintenance, High-Speed Scan Control Technology, Advanced GC Oven. A
new flow controller (AFC) with a CPU control carrier gas flow to a constant
flow speed, flowrate, or pressure. The new large-capacity differential exhaust
system enhances the vacuum performance when hydrogen or nitrogen is used as the
carrier gas, so the optimal MS state is achieved under all carrier gas
conditions. Internal contamination can
be confirmed visually, ensuring filters are replaced at the proper time.
Performance Injector port Carrier gas head pressure
setting up to 1035 kPa(150psi), Injection Port heating up to 450 degree C, High
power column oven heating up to 450 degree
C, Mass Range 1.5m/z to 1,090 m/z, Resolution (FWHM): 04. To 2 u, Maximum Scan rate of 20,000 amu /sec, EI Scan Sensitivity S/N Ratio >2000 RMS for
1 pg Octa fluoronaphthalene m/z 272, Vacuum System with 360 l/ sec, TMP with
Dual Inlet (190 l/sec for Ion Source and 170 ltr/sec for Detector) in
differential pumping modes Applications Food,
textile, plastic, water, biological fluids etc. pesticide, aroma, PAH,
phthalate, VOC, toxicology and NBS analyzes in samples etc. Location SMITA Analytical lab
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